Sfoglia per Rivista MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
The interaction between Xe and F in Si (100) pre-amorphised with 20 keV Xe and implanted with low energy BF2
2004-01-01 M., Werner; J., van den Berg; D. G., Armour; G., Carter; T., Feudel; Marc, Herden; Bersani, Massimo; Giubertoni, Damiano; P., Bailey; T. C. Q., Noakes
Transmission electron microscopy study of Ni-Si nanocomposite films
2012-01-01 M. A., Mohiddon; M. G., Krishna; G., Dalba; Rocca, Francesco
Understanding the role of buried Si/SiO2 interface on dopant and defect evolution in PAI USJ
2005-01-01 J., Hamilton; E., Collart; B., Colombeau; Bersani, Massimo; Giubertoni, Damiano; J., Sharp; N., Cowern; K. J., Kirkby
Titolo | Data di pubblicazione | Autore(i) | File |
---|---|---|---|
The interaction between Xe and F in Si (100) pre-amorphised with 20 keV Xe and implanted with low energy BF2 | 1-gen-2004 | M., Werner; J., van den Berg; D. G., Armour; G., Carter; T., Feudel; Marc, Herden; Bersani, Massimo; Giubertoni, Damiano; P., Bailey; T. C. Q., Noakes | |
Transmission electron microscopy study of Ni-Si nanocomposite films | 1-gen-2012 | M. A., Mohiddon; M. G., Krishna; G., Dalba; Rocca, Francesco | |
Understanding the role of buried Si/SiO2 interface on dopant and defect evolution in PAI USJ | 1-gen-2005 | J., Hamilton; E., Collart; B., Colombeau; Bersani, Massimo; Giubertoni, Damiano; J., Sharp; N., Cowern; K. J., Kirkby |
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